SiC MOSFET with built-in SBD for reduction of reverse recovery charge and switching loss in 10-kV applications

Huaping Jiang, Jin Wei, X. Dai, C. Zheng, Maolong Ke, Xiaochuan Deng, Y. Sharma, I. Deviny, P. Mawby
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引用次数: 38

Abstract

A silicon carbide (SiC) metal-oxide-semiconductor field-effect transistor (MOSFET) for 10-kV application is proposed in this paper, which features a built-in Schottky barrier diode (SBD). Therefore, the body diode is free from activation during the third quadrant conduction state, which is beneficial for reducing the switching loss and suppressing bipolar degradation. Numerical simulations with Sentaurus TCAD are carried out to investigate the characteristics of the proposed structure in comparison to the conventional MOSFET and SBD pair. It is found that the proposed structure achieves lower reverse recovery charge and switching loss owing to three factors, i.e., faster switching speed, smaller capacitive charge, and body diode deactivation, and therefore is a superior choice for 10-kV applications.
内置SBD的SiC MOSFET,用于减少10kv应用中的反向恢复电荷和开关损耗
提出了一种用于10kv应用的碳化硅(SiC)金属氧化物半导体场效应晶体管(MOSFET),其特点是内置肖特基势垒二极管(SBD)。因此,主体二极管在第三象限导通状态时不会被激活,这有利于降低开关损耗和抑制双极退化。利用Sentaurus TCAD进行了数值模拟,比较了该结构与传统的MOSFET和SBD对的特性。研究发现,由于开关速度更快、容性电荷更小和体二极管失活三个因素,该结构实现了更低的反向恢复电荷和开关损耗,因此是10kv应用的首选。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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