Effect of repetition rate on morphology of generated microstructure on silicon surface using low cost N2 laser in air medium

P. C. Singh, M. Alrefaee, S. Das
{"title":"Effect of repetition rate on morphology of generated microstructure on silicon surface using low cost N2 laser in air medium","authors":"P. C. Singh, M. Alrefaee, S. Das","doi":"10.1063/1.5131609","DOIUrl":null,"url":null,"abstract":"The systematic investigation has been carried out on the effect of repetition rate on morphology of the Si microstructures generated using an inexpensive Nitrogen (N2) nanosecond (ns) laser. The wavelength, pulse duration and pulse energy of the used laser are 337nm, ∼3.5ns and 170µJ respectively. The repetition rate of the laser was varied from 5Hz to 20Hz at constant sample scanning velocity of 0.005mm/s. All the experiments were carried out in the air medium. The morphological characterization of the produced microtextured Si were done by an ImageJ software calibrated USB Digital Microscope Endoscope Camera (UDMEC) and Field Emission Scanning Electron Microscope (FESEM). At constant sample velocity with low repetition rate, the periodic gratings like microstructures were observed on Si surface. With the increase of the repetition rate to 10Hz and 12Hz, the channel like groove based microstructures were generated. Further increasing the repetition rate to highest values of 20Hz, we observe the grooved based microstructures. It is also demonstrated that the width of the processed region can be increased with increase of the repetition rate. This significant optimized processing parameters using N2 ns laser microtextured Si surface is suitable for the generation Black Si in large area for the wide field of applications.The systematic investigation has been carried out on the effect of repetition rate on morphology of the Si microstructures generated using an inexpensive Nitrogen (N2) nanosecond (ns) laser. The wavelength, pulse duration and pulse energy of the used laser are 337nm, ∼3.5ns and 170µJ respectively. The repetition rate of the laser was varied from 5Hz to 20Hz at constant sample scanning velocity of 0.005mm/s. All the experiments were carried out in the air medium. The morphological characterization of the produced microtextured Si were done by an ImageJ software calibrated USB Digital Microscope Endoscope Camera (UDMEC) and Field Emission Scanning Electron Microscope (FESEM). At constant sample velocity with low repetition rate, the periodic gratings like microstructures were observed on Si surface. With the increase of the repetition rate to 10Hz and 12Hz, the channel like groove based microstructures were generated. Further increasing the repetition rate to highest values of 20Hz, we observe the grooved b...","PeriodicalId":435771,"journal":{"name":"INTERNATIONAL CONFERENCE ON INVENTIVE MATERIAL SCIENCE APPLICATIONS : ICIMA 2019","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"INTERNATIONAL CONFERENCE ON INVENTIVE MATERIAL SCIENCE APPLICATIONS : ICIMA 2019","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/1.5131609","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The systematic investigation has been carried out on the effect of repetition rate on morphology of the Si microstructures generated using an inexpensive Nitrogen (N2) nanosecond (ns) laser. The wavelength, pulse duration and pulse energy of the used laser are 337nm, ∼3.5ns and 170µJ respectively. The repetition rate of the laser was varied from 5Hz to 20Hz at constant sample scanning velocity of 0.005mm/s. All the experiments were carried out in the air medium. The morphological characterization of the produced microtextured Si were done by an ImageJ software calibrated USB Digital Microscope Endoscope Camera (UDMEC) and Field Emission Scanning Electron Microscope (FESEM). At constant sample velocity with low repetition rate, the periodic gratings like microstructures were observed on Si surface. With the increase of the repetition rate to 10Hz and 12Hz, the channel like groove based microstructures were generated. Further increasing the repetition rate to highest values of 20Hz, we observe the grooved based microstructures. It is also demonstrated that the width of the processed region can be increased with increase of the repetition rate. This significant optimized processing parameters using N2 ns laser microtextured Si surface is suitable for the generation Black Si in large area for the wide field of applications.The systematic investigation has been carried out on the effect of repetition rate on morphology of the Si microstructures generated using an inexpensive Nitrogen (N2) nanosecond (ns) laser. The wavelength, pulse duration and pulse energy of the used laser are 337nm, ∼3.5ns and 170µJ respectively. The repetition rate of the laser was varied from 5Hz to 20Hz at constant sample scanning velocity of 0.005mm/s. All the experiments were carried out in the air medium. The morphological characterization of the produced microtextured Si were done by an ImageJ software calibrated USB Digital Microscope Endoscope Camera (UDMEC) and Field Emission Scanning Electron Microscope (FESEM). At constant sample velocity with low repetition rate, the periodic gratings like microstructures were observed on Si surface. With the increase of the repetition rate to 10Hz and 12Hz, the channel like groove based microstructures were generated. Further increasing the repetition rate to highest values of 20Hz, we observe the grooved b...
低成本氮气激光在空气介质中对硅表面生成微观结构的影响
本文系统地研究了重复频率对廉价的氮(N2)纳秒(ns)激光生成的硅微结构形貌的影响。所用激光器的波长为337nm,脉冲持续时间为~ 3.5ns,脉冲能量为170µJ。在恒定的样品扫描速度为0.005mm/s的情况下,激光的重复频率在5Hz ~ 20Hz之间变化。所有实验都是在空气介质中进行的。利用ImageJ软件校准的USB数码显微镜内窥镜相机(UDMEC)和场发射扫描电子显微镜(FESEM)对制备的微织构硅进行形态学表征。在低重复率的恒定取样速度下,在硅表面观察到类似周期性光栅的微结构。当重复频率增加到10Hz和12Hz时,产生了沟槽状的微结构。进一步提高重复频率至20Hz的最高值,我们观察到沟槽基显微组织。实验还表明,处理区域的宽度可以随着重复频率的增加而增加。利用n2ns激光微织构硅表面的工艺参数进行了显著优化,适用于大面积生成黑硅,应用领域广泛。本文系统地研究了重复频率对廉价的氮(N2)纳秒(ns)激光生成的硅微结构形貌的影响。所用激光器的波长为337nm,脉冲持续时间为~ 3.5ns,脉冲能量为170µJ。在恒定的样品扫描速度为0.005mm/s的情况下,激光的重复频率在5Hz ~ 20Hz之间变化。所有实验都是在空气介质中进行的。利用ImageJ软件校准的USB数码显微镜内窥镜相机(UDMEC)和场发射扫描电子显微镜(FESEM)对制备的微织构硅进行形态学表征。在低重复率的恒定取样速度下,在硅表面观察到类似周期性光栅的微结构。当重复频率增加到10Hz和12Hz时,产生了沟槽状的微结构。进一步增加重复频率至20Hz的最大值,我们观察到沟槽b…
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信