Smart-array for pipelined BTI characterization

V. Putcha, Marko Simicic, P. Weckx, B. Parvais, J. Franco, B. Kaczer, D. Linten, D. Verkest, A. Thean, G. Groeseneken
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引用次数: 8

Abstract

Deeply-scaled transistors fabricated in advanced High-k/Metal Gate (HK/MG) technologies have an intrinsic variability, requiring characterization of a large number of transistors to obtain statistically relevant data. A powerful tool in the form of a Smart-array circuit is designed to serve the BTI characterization needs on an industrial scale, where time plays an important role. The Smart-array circuit is designed such that 700 pMOS and nMOS transistors can be measured using the concept of pipelining. A significant reduction of up to 88.5% in time is demonstrated by establishing a pipeline of 15 pMOS transistors and the Measure-Stress-Measure (MSM) scheme of choice.
用于流水线BTI表征的智能阵列
采用先进的高k/金属栅极(HK/MG)技术制造的深尺度晶体管具有内在的可变性,需要对大量晶体管进行表征才能获得统计相关数据。智能阵列电路形式的强大工具旨在满足工业规模的BTI表征需求,其中时间起着重要作用。智能阵列电路的设计使得700个pMOS和nMOS晶体管可以使用流水线的概念进行测量。通过建立一个由15个pMOS晶体管组成的流水线和选择的测量-应力-测量(MSM)方案,可以证明时间上的显著降低高达88.5%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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