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Neon Dense Plasma Focus Point X-ray Source For /spl les/ 0.25 /spl mu/m lithography

Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI:10.1109/PLASMA.1994.588868
R. Prasad, M. Krishnan, K. Berg, D. Conlon, J. Mangano
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氖致密等离子体焦点x射线源，用于/spl les/ 0.25 /spl mu/m光刻
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Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)
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