Measurement Of Ultrafast Oscillations In Vertical Cavity Lasers After Pulse Perturbation

D. Wiedenmarin, C. Jung, M. Grabherr, W. Schmid, G. Reiner, K. Splitthof, R. Michalzik, K. Ebeling
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Abstract

The temporally resolved emission of an electrically biased vertical caviw surface emitting laser (VCSEL) after perturbation with a short optical pulse has been measured with a high resolution up-conversion setup. Transverse multimode devices show very fast oscillations of the laser emission at frequencies corresponding to the lateral mode spacing. Introduction Vertical-cavity lasers are predestined devices for high speed optical communications. The small cavity volume of VCSELs promotes high photon densities and therefore high resonance frequencies of the devices. There are some reports on ultrafast oscillations in VCSELs with frequencies exceeding 50 GHz [1,2]. Normally they are attributed to ultrafast relaxation oscillations based on the oscillatory energy transfer between the electronic and the photonic system. But they are far beyond measurements of relative intensity noise (RIN) and small signal modulation [3]. In this paper we present results on investigations of the transient response of a running VCSEL to a perturbation of the intrinsic photon density. Our investigations are restricted to perturbations with pulses having the same photon energy as the VCSEL in order to get no transient carrier heating caused by carrier-carrier scattering. Laser Structure We investigate VCSELs with 3 I~.2Gao.8As/GaAs quantum wells emitting in the 980 nm wavelength regime [4]. The devices are grown on n-doped GaAs substrate, which is transparent for the emission wavelength of the device. Therefore an optical pulse with a center wavelength equal to the emission wavelength of the VCSEL can be coupled through the substrate into the active region. Current is injected through a ring contact on top of the device and through the substrate. Current confinement is achieved either through proton-implantation in the top mirror or through selective oxidation of a thin AlAs layer after mesa etching. The optical fields of the proton-implanted devices are gain and thermally induced index guided, whereas the oxidized devices are mainly index guided by the oxide aperture. Measurement Setup Fig1 shows the measurement setup. The sample is mounted such that a 100 fs pulse from a titanium sapphire (Ti:Sp) laser is coupled fiom the substrate side into the VCSEL cavity, and the device luminescence is monitored at the epitaxial side. In this setup we have the advantage that the intense backscattered light fiom the mirror of the VCSEL does not cause problems in the detection system. The laser luminescence can be measured either by an optical sampling scope with a time resolution of 25 ps or by up-conversion [5,6]. For that purpose the VCSEL output and a fraction of the Ti;Sp pulse are collimated on a crystal and mixed using type I phasematching. The polarization plane of the linearly polarized Ti:Sp pulse can be rotated
脉冲扰动后垂直腔激光器超快振荡的测量
用高分辨率上转换装置测量了短光脉冲扰动后电偏置垂直腔面发射激光器的时间分辨发射。横向多模器件在与横向模间隔对应的频率上显示出非常快的激光发射振荡。垂直腔激光器是高速光通信的必备器件。VCSELs的小腔体体积促进了高光子密度,从而提高了器件的高共振频率。在频率超过50 GHz的vcsel中有一些超快振荡的报道[1,2]。通常它们归因于基于电子和光子系统之间振荡能量传递的超快弛豫振荡。但它们远远超出了相对强度噪声(RIN)和小信号调制的测量[3]。本文给出了运行中的VCSEL对本征光子密度扰动的瞬态响应的研究结果。为了避免由载流子-载流子散射引起的瞬态载流子加热,我们的研究仅限于与VCSEL具有相同光子能量的脉冲扰动。我们研究了3i ~ 0.2 gao的vcsel。8As/GaAs量子阱在980 nm波长范围内发射[4]。该器件生长在n掺杂GaAs衬底上,该衬底对器件的发射波长是透明的。因此,中心波长等于VCSEL发射波长的光脉冲可以通过衬底耦合到有源区域。电流通过器件顶部的环形触点和基板注入。通过在顶镜中植入质子或在台面蚀刻后选择性氧化薄的AlAs层来实现电流约束。质子注入器件的光场主要是增益和热诱导折射率引导,而氧化器件的光场主要是氧化孔径折射率引导。图1显示了测量设置。样品的安装使得来自钛蓝宝石(Ti:Sp)激光器的100 fs脉冲从衬底侧耦合到VCSEL腔中,并且在外延侧监测器件的发光。在这种设置中,我们的优点是VCSEL反射镜的强背散射光不会在检测系统中引起问题。激光发光既可以通过时间分辨率为25ps的光学采样示波器测量,也可以通过上变频测量[5,6]。为此,VCSEL输出和Ti;Sp脉冲的一部分在晶体上准直,并使用I型相位匹配进行混合。线极化Ti:Sp脉冲的偏振面可以旋转
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