Investigation of quantum transport in nanoscaled GaN high electron mobility transistors

O. Baumgartner, Z. Stanojević, L. Filipovic, A. Grill, T. Grasser, H. Kosina, M. Karner
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引用次数: 1

Abstract

In this paper, a comprehensive investigation of quantum transport in nanoscaled gallium nitride (GaN) high electron mobility transistors (HEMTs) is presented. A simulation model for quantum transport in nanodevices on unstructured grids in arbitrary dimension and for arbitrary crystal directions has been developed. The model has been implemented as part of the Vienna-Schrödinger-Poisson simulation and modeling framework. The transport formalism is based on the quantum transmitting boundary method. A new approach to reduce its computational effort has been realized. The model has been used to achieve a consistent treatment of quantization and transport effects in deeply scaled asymmetric GaN HEMTs. The self-consistent electron concentration, conduction band edges and ballistic current have been calculated. The effects of strain relaxation at the heterostructure interfaces on the potential and carrier concentration have been shown.
纳米级氮化镓高电子迁移率晶体管中的量子输运研究
本文对纳米氮化镓(GaN)高电子迁移率晶体管(hemt)中的量子输运进行了全面的研究。建立了纳米器件在任意尺寸和任意晶体方向的非结构网格上的量子输运仿真模型。该模型已作为Vienna-Schrödinger-Poisson仿真和建模框架的一部分实现。传输形式是基于量子传输边界法的。实现了一种减少计算量的新方法。该模型已被用于实现深度尺度非对称GaN hemt中量化和输运效应的一致处理。计算了自洽电子浓度、导带边缘和弹道电流。研究了异质结构界面应变松弛对电势和载流子浓度的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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