Integrated CAD System for an MMIC using Symbolic Layout

Abstract

In this paper, a microwave symbolic layout is proposed as an interface between a circuit simulation and a mask pattern. This system is separated from the design of process oriented design rules allowing a designer to design a circuit without understanding the complicated MMIC process. An automatic conversion program has been also developed to convert from a mricrowave symbolic layout to a mask pattern. Using this system, a designer can consistently go from the circuit design operation to the mask data creation.