Microlens Lithography

R. Völkel, H. P. Herzig, P. Nussbaum, W. Singer, R. Dändliker
{"title":"Microlens Lithography","authors":"R. Völkel, H. P. Herzig, P. Nussbaum, W. Singer, R. Dändliker","doi":"10.1364/domo.1996.dwb.4","DOIUrl":null,"url":null,"abstract":"The future demands for flat panel display (FPD) manufacturing is a resolution of 3-5 μm for large substrates of 550 × 650 mm2 size. Standard lithographic techniques, like wafer stepping or proximity printing can be used. Unfortunately, these methods have some severe drawbacks which significantly increase the fabrication costs. Using a wafer stepper, the small printing area will cause numerous exposure steps. The stepping has to be very accurate, because stitching errors can be easily seen in the display pattern. Using a proximity printer, the substrate is set some 20-50 μm behind the mask to achieve a resolution of 3-5 μm. This is not an easy task for large substrates. The costs for these highly planar substrates are immense. A direct contact may easily damage the expensive photomask.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Diffractive Optics and Micro-Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/domo.1996.dwb.4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The future demands for flat panel display (FPD) manufacturing is a resolution of 3-5 μm for large substrates of 550 × 650 mm2 size. Standard lithographic techniques, like wafer stepping or proximity printing can be used. Unfortunately, these methods have some severe drawbacks which significantly increase the fabrication costs. Using a wafer stepper, the small printing area will cause numerous exposure steps. The stepping has to be very accurate, because stitching errors can be easily seen in the display pattern. Using a proximity printer, the substrate is set some 20-50 μm behind the mask to achieve a resolution of 3-5 μm. This is not an easy task for large substrates. The costs for these highly planar substrates are immense. A direct contact may easily damage the expensive photomask.
显微镜头光刻
平板显示器(FPD)制造的未来需求是在550 × 650 mm2尺寸的大型基板上实现3-5 μm的分辨率。标准平版印刷技术,如晶圆步进或接近印刷可以使用。不幸的是,这些方法有一些严重的缺点,这大大增加了制造成本。使用晶圆步进器时,较小的印刷面积会引起许多曝光步进。步进必须非常精确,因为在显示图案中很容易看到拼接错误。使用近距离打印机,基板被设置在掩模后约20-50 μm,以实现3-5 μm的分辨率。对于大型衬底来说,这不是一件容易的事。这些高度平面的基板的成本是巨大的。直接接触很容易损坏昂贵的光掩膜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信