Metal Enhanced Fluorescence Microarray Biochip using Glancing Angle Deposited Ag nanorods

M. A. Badshah, Seong-min Lee, Chengjun Jin, Seong-Cheol Byeon, Tasadduq Hussain, Muzahir Ali, Seok-min Kim
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Abstract

Glancing angle deposition (GLAD) is a physical vapor deposition process in which the substrate is placed to have a large incidence angle (>75°, angle between incoming flux and substrate normal). The GLAD process can be considered a promising method to fabricate metallic nanostructure on a large area at a low cost. GLAD Ag nanorods were fabricated and their fluorescence enhancement performances were examined. A practical antibody chip was realized using a 500 nm thick vertical Ag nanorods substrate. To overcome the limitations of GLAD Ag nanorod MEF substrate, Ag nanorods on micro post array substrate were also investigated.
利用掠射角沉积银纳米棒的金属增强荧光微阵列生物芯片
掠角沉积(GLAD)是一种物理气相沉积过程,在此过程中,衬底被放置在一个大入射角(>75°,入射通量与衬底法线之间的夹角)。GLAD工艺可以被认为是一种很有前途的低成本、大面积制备金属纳米结构的方法。制备了GLAD银纳米棒,并对其荧光增强性能进行了测试。采用500 nm厚的垂直银纳米棒衬底,实现了一种实用的抗体芯片。为了克服GLAD银纳米棒MEF衬底的局限性,还研究了微柱阵列衬底上的银纳米棒。
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