Design of 1Mbit RRAM memory to replace eFlash

W. Diels, Alexander Standaert
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引用次数: 2

Abstract

A 1Mbit RRAM memory robust against variations in 45nm technology is presented. The focus lies on read reliability. To overcome variability a tuned reference signal is generated by connecting multiple reference cells in parallel. A bitline load has been designed to obtain maximum bitline voltage difference. Sense amplifier performance has been improved by allowing overlap between passgate-enable and latch-enable signals, this overlap gives rise to a nonlinear phenomenon, the RC-latch-effect. Write operation has not been included in the design and the results are based on circuit simulations.
1Mbit随机存取存储器的设计以取代eFlash
提出了一种抗45nm工艺变化的1Mbit RRAM存储器。重点在于读可靠性。为了克服可变性,通过并联多个参考单元来产生调谐参考信号。位线负载被设计用来获得最大的位线电压差。通过允许通门使能和锁存使能信号之间的重叠,传感放大器的性能得到了改善,这种重叠引起了非线性现象,即rc锁存效应。设计中未考虑写入操作,结果基于电路仿真。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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