Passive Q-switching Nd: YAG Lasers Using Bulk Semiconductors

Y. Tsou, W. Chen, M. Birnbaum, E. Garmire, R. Asthana
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Abstract

Passive Q-switching has advantages over the other Q-switch schemes to generate short duration pulses with high peak power: light weight, low cost, design simplicity and absence of extra power sources. In addition to dyes, passive Q-switching of Nd:YAG lasers using saturable absorbers has been reported using crystals with color centers, and chromium-doped garnetse2 We report in this letter a passive Q-switching device using a bulk semiconductor epitaxial layer. Semiconductor-based Q-switches have the advantage that the absorption can be tuned so that the length of the device can be of several microns or even thinner. With the existing technology in epitaxial growth, band gaps of compound semiconductors can be engineered to cover almost the entire range of the spectrum from visible to infrared. Solid state lasers can be Q-switched by employing suitable compound semiconductors. For example, Vodopyanov et a1.3 have reported Q-switching an Er, Cr:Y SGG laser using InAs. The Nd:YAG 1.064 pm laser used had a rod p16.3X80 mm in a resonator formed by two flat dielectric mirrors of 100% and 55% reflectivity, separated by 30 cm. The rod was pumped by two Xe flashlamps with typical pump energy between 12 to 30 J in single-shot mode. The Qswitch used was a film of InGaAsP of band gap wavelength 1.09 pm grown by liquid phase epitaxy on an Fe-doped semi-insulating InP substrate. The back side of the substrate was mechanically polished after growth. Fig. 1 shows the measured transmission spectrum at room temperature. The small signal transmittance of the Q-switch was 17%. The saturable absorption measurement was performed with the same Nd:YAG laser but Qswitched by a plastic film coated with dye. The pulse width was 20 nsec. The InGaAsP sample was uncoated. Fig. 2 shows the transmittance as a function of the pump pulse energy at 1.064 pm. The saturated transmittance was 47%. Taken into account the Fresnel reflection loss resulting from both uncoated surfaces, the internal transmission was 90% at maximum. The saturation intensity was about 6x105 W/cm2. The sample was then placed in between the rear mirror and the laser rod, aligned at normal incidence. The Q-switched pulses, shown in Fig. 3, were recorded using a fast InGaAs detector. They had energy of lmJ/pulse and the FWHM of the pulses was 30 nsec. Increasing the pump energy resulted in multiple pulses, with the energy per pulse fluctuation less than 5%. The total energy in the Q-switched pulses was well below the corresponding energy under the free running condition with the same pump energy. The unbleachable loss introduced to the cavity by the Qswitch sample is a primay cause of the low output. No substructure in the pulse was measured, due to the resolution limit of our detection system. Damage to the semiconductor sample was not observed in the saturable absorption measurement, where the highest pump intensity was 8x lo6 W/cm2. However, some damage was observed while experimenting Q-switching effec’i for several days. The damage is suspected to be related to the thermal effects. Q-switching operation did not cease and the energy per pulse did not deteriorate.
无源调q Nd: YAG激光器
无源q开关与其他q开关方案相比,具有重量轻、成本低、设计简单和不需要额外电源的优点,可以产生具有高峰值功率的短持续脉冲。除了染料之外,使用饱和吸收剂的Nd:YAG激光器的无源q开关已经被报道使用具有色心的晶体和掺杂铬的石榴石2。我们在这封信中报告了一种使用体半导体外延层的无源q开关装置。基于半导体的q开关的优点是可以调节吸收,因此器件的长度可以是几微米甚至更薄。利用现有的外延生长技术,化合物半导体的带隙几乎可以覆盖从可见到红外的整个光谱范围。采用合适的化合物半导体可以实现固体激光器的调q。例如,Vodopyanov等人报道了使用InAs进行Er, Cr:Y SGG激光器的q开关。使用的Nd:YAG 1.064 pm激光器在由两个反射率为100%和55%的平面介电镜组成的谐振腔中具有p16.3X80 mm的棒,相隔30 cm。在单次模式下,用两个典型的泵浦能量在12到30 J之间的氙气手电筒泵送杆。所使用的Qswitch是在掺铁半绝缘InP衬底上通过液相外延生长的带隙波长为1.09 pm的InGaAsP薄膜。基材的背面在生长后进行机械抛光。图1为室温下测得的透射光谱。q开关的小信号透过率为17%。用同样的Nd:YAG激光器进行了饱和吸收测量,但用涂有染料的塑料薄膜进行了q开关。脉冲宽度为20秒。InGaAsP样品未涂覆。图2显示了在1.064 pm时泵浦脉冲能量的透射率函数。饱和透光率为47%。考虑到两个未涂层表面的菲涅耳反射损失,内部透射率最大为90%。饱和强度约为6x105 W/cm2。然后将样品置于后视镜和激光棒之间,以正常入射对齐。使用快速InGaAs探测器记录了如图3所示的q开关脉冲。它们的能量为lmJ/脉冲,脉冲的频宽为30秒。增加泵浦能量可以产生多个脉冲,每个脉冲的能量波动小于5%。在相同泵浦能量的情况下,调q脉冲的总能量远低于自由运行状态下的相应能量。由Qswitch样品引入腔的不可漂白损耗是低输出的主要原因。由于检测系统的分辨率限制,没有测量到脉冲中的子结构。在饱和吸收测量中没有观察到半导体样品的损坏,其中最高泵浦强度为8 × lo6 W/cm2。然而,在连续数天的q开关实验中,观察到一些损伤。损坏被怀疑与热效应有关。调q操作没有停止,每个脉冲的能量也没有下降。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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