3-dimensional structures of pores in low-k films observed by quantitative TEM tomograph and their impacts on penetration phenomena

M. Shimada, J. Shimanuki, N. Ohtsuka, A. Furuya, Y. Inoue, S. Ogawa
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引用次数: 3

Abstract

3-dimensional structures of pores in porous low-k films have been quantitatively observed by transmission electron microscopy (TEM) tomographic technique for the first time. The 3-dimensional (3-D) reconstruction images clarified that the shape of pores are distorted and connectivity of the pores, such as open or close pores, depended on pore formation technique in the films, e.g. template or nano-clustering technique. Quantitative information of pores structure from 3-D reconstruction images were obtained using a 3-D structure analysis algorithm. The size of pores and connectivity influenced on metal penetration into the pores during atomic layer deposition (ALD) and chemical penetration which resulted in void formation in porous low-k films.
定量TEM层析观察低钾薄膜孔隙的三维结构及其对渗透现象的影响
利用透射电子显微镜(TEM)层析成像技术首次定量观察了多孔低钾薄膜中孔隙的三维结构。三维重建图像表明,孔隙的形状是扭曲的,孔隙的连通性(如开孔或闭孔)取决于薄膜中的孔隙形成技术,如模板或纳米聚类技术。利用三维结构分析算法从三维重建图像中获得孔隙结构的定量信息。孔隙的大小和连通性影响了原子层沉积(ALD)过程中金属对孔隙的渗透和化学渗透,从而导致多孔低钾薄膜的孔隙形成。
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