Novel Closing Switches on the Base of Fast Ionization Fronts in Semiconductors

I. Grekhov, S. Korotkov, P. Rodin
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Abstract

Summary form only given. Subnanosecond switching of Si diode under fast (> 1 kV/ns) overvoltage in reverse direction was observed for the first time in 1979. Later it was shown that very efficient closing switches can be designed on the basis of this phenomenon in the p+npn+ dynistor structures. These devices - called fast ionization dynistors (FIDs) - have become the main elements of high power pulse generators of nano and subnanosecond range. Physical basis of fast switching of FIDs is the passage of fast ionization front in the wide n-base of the p+npn+ dinistor structure. The impact ionization in the neutral part of the n-base is considered as a source of free carriers that initiate this passage. Recently we found that tunnel emission from deep (~ 0.5 eV) electron traps is the possible source of free carriers for ionization front triggering. These traps are produced in the n-base during the manufacturing process. Neutral part of the n-base is not necessary in this case. Hence the total thickness of the base layer can be considerably reduced. As a result the residual voltage just after switching (0.1-0.5 ns) as well as during high current conducting mode (10-100 ns) decreases several times. Devices with such triggermg mechanism are called deep level dynistors (DLDs). Several types of DLD-based generators will be discussed in this presentation to illustrate these devices application areas: (i) nitrogen laser pumping (15 kV, 1 kA, 2 ns, 100 Hz), high voltage pulse generator (40 kV, 2kA, 3 ns), high power pulse generator (25 kV, 5 kA, 300 ns) for triggering the RSD-based switch (25 kV, 200 kA, 500 microsec) used for high power solid-state laser pumping. Computer simulations show that overvoltage with 10 kV/ns raise rate applied to the diode without any traps gives a possibility to achieve the electric field strength as high as 106 V/cm at the pn junction. Then free electrons are generated via band-to-band tunneling in the region of highest electric field and initiate passage of superfast ionization front with velocity ~5 108 cm/s. Typical turn-on time in this case can be as short as 20 ps.
基于半导体快速电离前沿的新型闭合开关
只提供摘要形式。1979年首次观察到硅二极管在快速(> 1 kV/ns)反向过电压下的亚纳秒开关。后来的研究表明,基于这一现象,可以在p+npn+动态电阻结构中设计出非常高效的闭合开关。这些器件被称为快速电离监测器(fid),已成为纳米和亚纳秒级高功率脉冲发生器的主要元件。FIDs快速开关的物理基础是在p+npn+阻值结构的宽n碱基中快速电离锋的通过。n碱基中性部分的冲击电离被认为是自由载流子的来源,引发了这一通道。最近我们发现深层(~ 0.5 eV)电子阱的隧道发射可能是电离前沿触发自由载流子的来源。这些陷阱是在制造过程中产生的n碱基。在这种情况下,n的中性部分是不必要的。因此,基材层的总厚度可以大大减少。结果,开关后(0.1-0.5 ns)和大电流传导模式(10-100 ns)的剩余电压降低了几倍。具有这种触发机制的器件称为深电平动态电阻器(dld)。本演讲将讨论几种基于dld的发生器,以说明这些器件的应用领域:(i)氮激光泵浦(15 kV, 1 kA, 2 ns, 100 Hz),高压脉冲发生器(40 kV, 2kA, 3 ns),用于触发基于rsd的开关(25 kV, 200 kA, 500微秒)的高功率脉冲发生器(25 kV, 5 kA, 300 ns),用于高功率固态激光泵浦。计算机模拟结果表明,在二极管上施加10 kV/ns的升压速率,而不施加任何陷阱,可以在pn结处实现高达106 V/cm的电场强度。然后在最高电场区通过带对带隧穿产生自由电子,引发速度~5 108 cm/s的超高速电离锋通过。在这种情况下,典型的开启时间可短至20ps。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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