Modelling the mechanism of multipactor suppression through novel laser engineered structures

J. Smith, R. Valizadeh, O. Malyshev
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Abstract

Electron multipactor is a major problem in accelerators, both in accelerating cavities associated with dark current and beam induced e-cloud problems, and in RF distribution systems leading to catastrophic damage or in mild cases performance decrease and phase shifting. Laser treatments have been shown experimentally to reduce the Secondary Electron Yield (SEY). A full understanding of the mechanism is desirable, to allow optimisation of the surface morphology. In this poster, the Particle-in-cell (PIC) framework VSim [1] is used to gain this knowledge.
通过新型激光工程结构对多因子抑制机理进行建模
电子多因子是加速器中的一个主要问题,无论是在与暗电流和光束引起的电子云问题相关的加速腔中,还是在导致灾难性损坏或在轻微情况下导致性能下降和相移的射频分配系统中。实验表明激光处理可以降低二次电子产率(SEY)。充分了解这一机制是必要的,以便对表面形貌进行优化。在这张海报中,使用了单元内粒子(PIC)框架VSim[1]来获得这些知识。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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