{"title":"New PSCAR concept promising high sensitivity resist overcoming problems of RLS trade-off, LER and stochastic defects (Conference Presentation)","authors":"S. Tagawa","doi":"10.1117/12.2514817","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":437977,"journal":{"name":"Advances in Patterning Materials and Processes XXXVI","volume":"34 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-03-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Patterning Materials and Processes XXXVI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2514817","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}