Development of a Cryogenic Silicon Cavity Stabilized Laser

B. Marechal, D. F. Tetsing Talla, J. Millo, C. Rocher, P. Bourgeois, G. Goavec-Mérou, C. Lacroûte, E. Rubiola, Y. Kersalé
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引用次数: 2

Abstract

In this paper, we present the current development status of a cavity stabilized laser at 1550 nm. The expected thermal noise limit of the silicon Fabry-Perot cavity is $3\times 10^{-17}$ at 17 K in terms of fractional frequency instability. We cooled it to its thermal expansion turning point, measured at 18.1 K, with a pulse-tube based cryocooler. Thanks to the thermal filtering and the temperature control of the cavity, the temperature induced fractional frequency instability is below the thermal noise up to 1000 s of integration time. We also discuss the vibration induced limitations, the thermal characterization of the cryocooler and the digital servo implementation and performances.
低温硅腔稳定激光器的研制
本文介绍了1550 nm腔稳定激光器的发展现状。在分数频率不稳定性方面,硅法布里-珀罗腔的期望热噪声极限为$3\乘以10^{-17}$。我们将其冷却到其热膨胀转折点,测量温度为18.1 K,使用基于脉冲管的制冷机。通过热滤波和腔体温度控制,温度引起的分数频率不稳定性在积分时间为1000 s时低于热噪声。我们还讨论了振动引起的限制,制冷机的热特性和数字伺服的实现和性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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