N. Azhar, S. S. Shariffudin, I. H. Affendi, S. H. Herman, M. Rusop
{"title":"Electrical properties of tetrapod zinc oxide thin films deposited by thermal-CVD method","authors":"N. Azhar, S. S. Shariffudin, I. H. Affendi, S. H. Herman, M. Rusop","doi":"10.1109/ISCAIE.2014.7010218","DOIUrl":null,"url":null,"abstract":"Zinc oxide (ZnO) thin films were deposited by thermal chemical vapor deposition (TCVD) method. Gold (Au) metal was used as a catalyst to improve the growth of tetrapod ZnO structures. In this study, the substrates were deposited at 750°C to 800°C to study the temperature effect of tetrapod ZnO thin films. The surface morphology of ZnO thin films were characterized using field emission scanning electron microscope (FE-SEM). Energy dispersive X-ray (EDX) was analyzed to identify element composition of ZnO thin films. It exhibits the EDX spectrum was successful grown product which contains Zn and O only. The electrical properties were measured using 2-point probe I-V measurement. From I-V curve, the resistivity of ZnO thin films decreases, the films become more conductive as deposition temperature increased. The optical properties were measured through photoluminescence (PL) with wavelength 325 nm to 900 nm.","PeriodicalId":385258,"journal":{"name":"2014 IEEE Symposium on Computer Applications and Industrial Electronics (ISCAIE)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE Symposium on Computer Applications and Industrial Electronics (ISCAIE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISCAIE.2014.7010218","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Zinc oxide (ZnO) thin films were deposited by thermal chemical vapor deposition (TCVD) method. Gold (Au) metal was used as a catalyst to improve the growth of tetrapod ZnO structures. In this study, the substrates were deposited at 750°C to 800°C to study the temperature effect of tetrapod ZnO thin films. The surface morphology of ZnO thin films were characterized using field emission scanning electron microscope (FE-SEM). Energy dispersive X-ray (EDX) was analyzed to identify element composition of ZnO thin films. It exhibits the EDX spectrum was successful grown product which contains Zn and O only. The electrical properties were measured using 2-point probe I-V measurement. From I-V curve, the resistivity of ZnO thin films decreases, the films become more conductive as deposition temperature increased. The optical properties were measured through photoluminescence (PL) with wavelength 325 nm to 900 nm.