Empowering ASIC Front-End to Meet the Challenges of the Ultra Deep Sub-Micrometer

V. K, R. A, K. Suriya Kumar, M. Kannan
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Abstract

The major problem posed by very deep sub-micrometer is the inaccuracies which it introduces into the conventional electronic design automation tool estimates. The estimates of power and speed reported by these tools do not consider the effects posed by very deep sub micrometer because of the non-availability of 45 nm cell libraries. Thus, there is an urgent need of a design flow which results in power and speed predictions at very deep sub micrometer considering the various issues in the same. The objective of this research paper is to analyze the prerequisites for electronic design automation tool which provides the front-end engineer the real insight into the physical manifestation of the design in the deep sub-micron. The tool has been partially implemented using PERL, and has yielded results which have been validated at 180 nm after comparison with conventional synthesis engines. The accuracy of results depends solely on the accuracy of the sub 65 nm models employed for gates and interconnects
赋能ASIC前端,迎接超深亚微米的挑战
甚深亚微米带来的主要问题是它给传统的电子设计自动化工具估计带来了不准确性。这些工具所报告的功率和速度的估计没有考虑到极深亚微米造成的影响,因为45纳米电池库不可用。因此,迫切需要一种设计流程,能够在非常深的亚微米下预测功率和速度,同时考虑到各种问题。本文的研究目的是分析电子设计自动化工具的先决条件,为前端工程师提供深入亚微米设计物理表现的真实洞察。该工具已部分使用PERL实现,并在180 nm下与传统合成引擎进行了比较,结果得到了验证。结果的准确性仅取决于用于栅极和互连的65nm以下模型的准确性
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