Electron emission from boron nitride films deposited on patterned substrates

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737) Pub Date : 2004-07-11 DOI:10.1109/IVNC.2004.1355009

H. Shima, S. Funakawa, C. Kimura, T. Sugino

引用次数: 0

Abstract

In this paper field emission characteristics are investigated for the BN nanofilm deposited on the patterned substrate which leads to an increase of the field enhancement factor. A reduction in the threshold electric field and an increase of the emission site are demonstrated. Uniformity of the electron emission is significantly improved.

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图案化衬底上氮化硼薄膜的电子发射

本文研究了在图案化衬底上沉积的氮化硼纳米膜的场发射特性，从而提高了场增强系数。结果表明，阈值电场的减小和发射位点的增加。电子发射的均匀性得到了显著改善。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Technical Digest of the 17th International Vacuum Nanoelectronics Conference (IEEE Cat. No.04TH8737)

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