Nano-gap fabrication by focused ion beam for DNA trapping

Abstract

Micromachined tweezers is having nanometer sized gap was fabricated with a silicon etching method and a focussed ion beam technique. The gap of tweezer fabricated by this process was accomplished to be 15 nm-2 mum ranges. The validity of this tweezers was demonstrated by trapping DNA molecules. Trapping of bundle of lambda-DNA molecules between 100 mum gap was succeeded