600MM Wafer-Level Fan Out on Panel Level Processing with 6-Sided Die Protection

Jacinta Aman Lim, Yun-Mook Park, Byung-Cheol Kim, Edil Devera
{"title":"600MM Wafer-Level Fan Out on Panel Level Processing with 6-Sided Die Protection","authors":"Jacinta Aman Lim, Yun-Mook Park, Byung-Cheol Kim, Edil Devera","doi":"10.23919/IWLPC52010.2020.9375887","DOIUrl":null,"url":null,"abstract":"300mm carrier wafer for Fan-Out Wafer Level Packaging (FOWLP), is currently the mainstream format used for PMICs, RF and other single die applications. As volume of these devices continue to ramp up, the 300mm medium used for Fan-Out processing continues to stay the same. The need for migrating to panel sizes larger than 300mm becomes a necessity to lower down costs and handle higher volumes. The fastest adoption of Fan-Out technology is now in 5G, automotive and healthcare. Traditional applications such as audio codecs, PMICs, microcontroller units (MCU) and radio frequency (RF) continue to use Fan-Out Wafer Level Packaging (FOWLP) as an alternative to Wafer Level Chip Scale packaging (WLCSP) due to its 5 -sided or 6-sided die protection. As Fan Out packaging becomes mainstream and to get broader adoption of Fan-Out, the need for driving down the cost continues to be at the forefront of Fan-Out suppliers. 600mm × 600mm format utilized in this study leverages existing backend processing equipment used on 200mm and 300mm wafers for cost savings. Utilizing existing equipment would enable the panel to be singulated into 4 × 300mm or 9 × 200mm square segments to enable probe testing. Coupling the 6-sided die protection process (M-Series) with 600mm × 600mm panel level processing paves the way for innovative methods for Fan-Out processing. New photolithography processing utilizing laser direct imaging (Adaptive Patterning ™) to auto scale for die shift mitigation, is heavily dependent on segmentation of the panel. In this instance, the 600mm panel is either segmented into 4 × 300mm, 9 × 200mm or l×600mm for Photolithography steps. Depending on the number of fiducials used during the photolithography steps, capital expenditure and exposure accuracy would be highly dependent on the segmentation chosen. In addition, new metrology tools and panel warpage management will need to be considered for quality assurance. This paper will present a case study of utilizing 600mm × 600mm panel size to process a single die with 6-sided die protection (M-Series). Considerations for repassivation, redistribution layer and solder ball placement will be discussed. Challenges pertaining to large panel processing through the repassivation and redistribution layer will be presented, panel level inspection considerations post mold cure, reliability considerations and future of 600mm × 600mm panel level processing for 6-sided die protection will be summarized.","PeriodicalId":192698,"journal":{"name":"2020 International Wafer Level Packaging Conference (IWLPC)","volume":"146 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Wafer Level Packaging Conference (IWLPC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/IWLPC52010.2020.9375887","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

300mm carrier wafer for Fan-Out Wafer Level Packaging (FOWLP), is currently the mainstream format used for PMICs, RF and other single die applications. As volume of these devices continue to ramp up, the 300mm medium used for Fan-Out processing continues to stay the same. The need for migrating to panel sizes larger than 300mm becomes a necessity to lower down costs and handle higher volumes. The fastest adoption of Fan-Out technology is now in 5G, automotive and healthcare. Traditional applications such as audio codecs, PMICs, microcontroller units (MCU) and radio frequency (RF) continue to use Fan-Out Wafer Level Packaging (FOWLP) as an alternative to Wafer Level Chip Scale packaging (WLCSP) due to its 5 -sided or 6-sided die protection. As Fan Out packaging becomes mainstream and to get broader adoption of Fan-Out, the need for driving down the cost continues to be at the forefront of Fan-Out suppliers. 600mm × 600mm format utilized in this study leverages existing backend processing equipment used on 200mm and 300mm wafers for cost savings. Utilizing existing equipment would enable the panel to be singulated into 4 × 300mm or 9 × 200mm square segments to enable probe testing. Coupling the 6-sided die protection process (M-Series) with 600mm × 600mm panel level processing paves the way for innovative methods for Fan-Out processing. New photolithography processing utilizing laser direct imaging (Adaptive Patterning ™) to auto scale for die shift mitigation, is heavily dependent on segmentation of the panel. In this instance, the 600mm panel is either segmented into 4 × 300mm, 9 × 200mm or l×600mm for Photolithography steps. Depending on the number of fiducials used during the photolithography steps, capital expenditure and exposure accuracy would be highly dependent on the segmentation chosen. In addition, new metrology tools and panel warpage management will need to be considered for quality assurance. This paper will present a case study of utilizing 600mm × 600mm panel size to process a single die with 6-sided die protection (M-Series). Considerations for repassivation, redistribution layer and solder ball placement will be discussed. Challenges pertaining to large panel processing through the repassivation and redistribution layer will be presented, panel level inspection considerations post mold cure, reliability considerations and future of 600mm × 600mm panel level processing for 6-sided die protection will be summarized.
600MM圆片级扇出面板级加工,6面模具保护
用于扇出晶圆级封装(FOWLP)的300mm载流子晶圆,是目前用于pmic, RF和其他单芯片应用的主流格式。随着这些器件的体积不断增加,用于扇出处理的300mm介质继续保持不变。为了降低成本和处理更高的产量,需要迁移到大于300mm的面板尺寸。目前,5G、汽车和医疗保健领域是扇出技术应用最快的领域。传统应用,如音频编解码器,pmic,微控制器单元(MCU)和射频(RF)继续使用扇出晶圆级封装(FOWLP)作为晶圆级芯片规模封装(WLCSP)的替代方案,因为它的5面或6面芯片保护。随着扇出封装成为主流,并得到更广泛的采用,降低成本的需求仍然是扇出供应商的首要任务。本研究中使用的600mm × 600mm格式利用现有的后端加工设备用于200mm和300mm晶圆,以节省成本。利用现有的设备将使面板被分割成4 × 300mm或9 × 200mm的正方形片段,以便进行探针测试。将6面模具保护工艺(m系列)与600mm × 600mm面板级加工相结合,为扇出加工的创新方法铺平了道路。新型光刻工艺利用激光直接成像(Adaptive Patterning™)来自动缩放以减轻模移,这在很大程度上依赖于面板的分割。在这种情况下,600mm的面板被分割成4 × 300mm, 9 × 200mm或l×600mm用于光刻步骤。根据光刻步骤中使用的基准的数量,资本支出和曝光精度将高度依赖于所选择的分割。此外,新的计量工具和面板翘曲管理将需要考虑质量保证。本文将介绍一个利用600mm × 600mm面板尺寸加工带有6面模具保护(m系列)的单个模具的案例研究。对再钝化、再分配层和焊料球放置的考虑将被讨论。将介绍通过再钝化和再分配层进行大型面板加工的挑战,总结模具固化后面板水平检查的考虑因素,可靠性考虑因素以及600mm × 600mm 6面模具保护面板水平加工的未来。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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