Multi Composition GeSi Tuneable Concentration Silicon-Germanium Wire Structures for CMOS Photonics

K. Grabska, S. Saito, M. Banakar, T. D. Bucio, M. Nedeljkovic, C. Littlejohns, F. Gardes, A. Ballabio, A. Barzaghi, G. Isella
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Abstract

In this presentation, we report for the first time Rapid Melt Growth SiGe based structures embedded in an SOI platform with constant siGe composition over the length of the SiGe wires. This method is suitable for waveguide integration on the SOI platform which is crucial for multi wavelength operation of Franz Keldysh type modulators.
用于CMOS光子学的多组分GeSi可调浓度硅锗线结构
在本次演讲中,我们首次报道了嵌入在SOI平台中的基于快速熔体生长SiGe的结构,该结构在SiGe导线的长度上具有恒定的SiGe成分。该方法适用于SOI平台上的波导集成,这对Franz Keldysh型调制器的多波长工作至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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