Surface Evaluation Techniques for the Optics of the Future

J. Bennett
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引用次数: 23

Abstract

A key to improving the performance of optics and optical systems is to reduce scattering and absorption losses in thin film coatings and in the underlying substrates. Scattering can be measured by collecting the light scattered into a hemisphere (total integrated scattering, or TIS) or as a function of angle. The scattering can be related via scalar or vector scattering theories to the root mean square roughness and other statistical properties of the samples. Surface roughness can be measured by a noncontact heterodyne interferometric technique or a diamond stylus profiling instrument. If the optics are too large to fit into the measuring instruments, replicas can be made of parts of the surface and analyzed using one of the above techniques. Subsurface damage produced by the polishing process can in some cases be determined by a light scattering technique. Absorption in substrates and coatings can be distinguished from absorption at air-film or film-substrate interfaces using adiabatic calorimetry. The techniques to be described can measure absorption in parts per thousand, scattered light in parts per million, and surface roughness down to nearly atomic dimensions. Examples of some of the higher performance optics made possible by the sensitive evaluation techniques will also be given.
未来光学的表面评价技术
提高光学和光学系统性能的关键是减少薄膜涂层和底层衬底中的散射和吸收损失。散射可以通过收集散射到一个半球的光(总积分散射,或TIS)或作为角度的函数来测量。散射可以通过标量或矢量散射理论与样品的均方根粗糙度和其他统计特性联系起来。表面粗糙度可以通过非接触式外差干涉测量技术或金刚石触针轮廓仪来测量。如果光学元件太大而无法装入测量仪器,则可以用表面的某些部分制作复制品,并使用上述技术之一进行分析。在某些情况下,抛光过程产生的亚表面损伤可以通过光散射技术来确定。利用绝热量热法可以将基材和涂层中的吸收与空气-膜或薄膜-基材界面的吸收区别开来。所描述的技术可以测量千分之一的吸收,百万分之一的散射光,以及接近原子尺寸的表面粗糙度。本文还将给出一些通过灵敏的评价技术使性能更高的光学器件成为可能的例子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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