Analysis of detection properties of particle detectors based on 4H-SiC high quality epitaxial layer

B. Zat’ko, F. Dubecký, K. Sedlačková, A. Šagátová, P. Boháček, M. Sekáčová, V. Nečas
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Abstract

The 4H polytype SiC is a promising material for radiation-resistant sensors of ionizing particles. In this work we focused on the analysis of active region thickness of detectors based on 4H-SiC. The detectors investigated are fabricated from a 105 μm epitaxial layer grown on 350 μm 4H-SiC substrate. The circular Schottky contacts with diameter of 1.4 mm using an Au/Ni double layer were evaporated onto both sides of the detector material. The capacitance-voltage measurements allowed us to estimate free carrier concentration profile. The second method consists of measuring detection efficiency of γ-rays at reverse bias voltages up to 500 V.
基于4H-SiC高质量外延层的粒子探测器检测性能分析
4H多型碳化硅是一种很有前途的电离粒子抗辐射传感器材料。本文主要对基于4H-SiC的探测器的有源区厚度进行了分析。所研究的探测器由生长在350 μm 4H-SiC衬底上的105 μm外延层制备而成。利用Au/Ni双层将直径为1.4 mm的圆形肖特基触点蒸发到探测器材料的两侧。电容电压测量使我们能够估计自由载流子浓度分布。第二种方法是测量高达500 V的反向偏置电压下γ射线的探测效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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