{"title":"VSS-Bias-Based Measurement of Random Telegraph Noise in Hybrid SRAM PUF after Hot Carrier Injection Burn-in","authors":"Kunyang Liu, Yichen Tang, Shufan Xu, H. Shinohara","doi":"10.1109/ICMTS55420.2023.10094138","DOIUrl":null,"url":null,"abstract":"In this paper, a method to observe random telegraph noise in a hybrid SRAM PUF array is presented. This allows low-cost observation of RTN in a number of bitcells by applying VSS bias voltages to measure their temporal mismatches. Also, the changes in RTN amplitude after hot carrier injection burn-in, which is used for PUF stabilization, have been measured and analyzed. Experimental results from a 130-nm CMOS test chip show that the average RTN amplitude across 80-run measurements increases from 1.46 mV before HCI to 9.72 mV after 18-min HCI. The maximum RTN amplitude also increases from 10.13 mV to 84.50 mV. These results indicate that RTN is not an omittable factor especially for a PUF using a hot carrier injection-based stabilization technique and should be carefully considered when deciding the burn-in strategy.","PeriodicalId":275144,"journal":{"name":"2023 35th International Conference on Microelectronic Test Structure (ICMTS)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 35th International Conference on Microelectronic Test Structure (ICMTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS55420.2023.10094138","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper, a method to observe random telegraph noise in a hybrid SRAM PUF array is presented. This allows low-cost observation of RTN in a number of bitcells by applying VSS bias voltages to measure their temporal mismatches. Also, the changes in RTN amplitude after hot carrier injection burn-in, which is used for PUF stabilization, have been measured and analyzed. Experimental results from a 130-nm CMOS test chip show that the average RTN amplitude across 80-run measurements increases from 1.46 mV before HCI to 9.72 mV after 18-min HCI. The maximum RTN amplitude also increases from 10.13 mV to 84.50 mV. These results indicate that RTN is not an omittable factor especially for a PUF using a hot carrier injection-based stabilization technique and should be carefully considered when deciding the burn-in strategy.