Influence of Driving Circuit Parameters and Layout Compactness on the Optimum Selection of Gate-Source Voltage Test Point for SiC MOSFETs

Haihong Qin, Sixuan Xie, Wenming Chen, F. Bu, Jiangjin Peng, Dafeng Fu
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Abstract

Accurate measurement of the gate-source voltage for silicon carbide (SiC) MOSFET is an essential prerequisite for correctly evaluating the reliability of driving circuit. Due to the high switching speed of SiC MOSFET, it is more sensitive to parasitic parameters of circuit, the measurement error caused by traditional test methods cannot be ignored in SiC MOSFET driving circuit. In this paper, we establish the equivalent model of driving circuit considering parasitic parameters, and analyze the difference between the gate-source voltage and test voltage at different test points. Then, the influence of the driving circuit parameters and layout compactness on the test voltage error is quantitatively analyzed. And the optimum selection method of gate-source voltage test point is proposed. The experiments based on double pulse platform were given to verify the correctness of theoretical analysis and simulation results.
驱动电路参数和布局紧凑性对SiC mosfet栅源电压测试点优选的影响
准确测量碳化硅MOSFET的栅源电压是正确评估驱动电路可靠性的必要前提。由于SiC MOSFET的高开关速度,对电路的寄生参数更为敏感,在SiC MOSFET驱动电路中,传统测试方法造成的测量误差不容忽视。本文建立了考虑寄生参数的驱动电路等效模型,分析了不同测试点的门源电压与测试电压的差异。然后,定量分析了驱动电路参数和布局紧凑性对测试电压误差的影响。并提出了栅源电压测试点的优选方法。在双脉冲平台上进行了实验,验证了理论分析和仿真结果的正确性。
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