Theory of sheaths near positively biased electrodes

B. Scheiner, S. Baalrud, B. Yee, M. Hopkins, E. Barnat
{"title":"Theory of sheaths near positively biased electrodes","authors":"B. Scheiner, S. Baalrud, B. Yee, M. Hopkins, E. Barnat","doi":"10.1109/PLASMA.2016.7534341","DOIUrl":null,"url":null,"abstract":"Summary form only given. Recent work [1] has shown that electron sheaths, such as those around Langmuir probes collecting the electron saturation current, can affect the bulk plasma through a presheath. Unlike typical ion presheaths, where ions are directly accelerated through an electric field, the electron presheath accelerates electrons to approximately an electron thermal speed through a force due to pressure gradients. Under typical low temperature plasma conditions, the electron presheath can be several times longer than an ion presheath under the same plasma conditions. This work shows that electron presheaths can contain a virtual cathode, which is a local minimum in the plasma potential in front of the sheath, when the electrode is adjacent to a dielectric surface. Physics associated with this layer, including ion pumping from the potential well, is revisited in view of the recent advances in understanding electron flow in electron presheaths [1].","PeriodicalId":424336,"journal":{"name":"2016 IEEE International Conference on Plasma Science (ICOPS)","volume":"54 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Conference on Plasma Science (ICOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PLASMA.2016.7534341","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Summary form only given. Recent work [1] has shown that electron sheaths, such as those around Langmuir probes collecting the electron saturation current, can affect the bulk plasma through a presheath. Unlike typical ion presheaths, where ions are directly accelerated through an electric field, the electron presheath accelerates electrons to approximately an electron thermal speed through a force due to pressure gradients. Under typical low temperature plasma conditions, the electron presheath can be several times longer than an ion presheath under the same plasma conditions. This work shows that electron presheaths can contain a virtual cathode, which is a local minimum in the plasma potential in front of the sheath, when the electrode is adjacent to a dielectric surface. Physics associated with this layer, including ion pumping from the potential well, is revisited in view of the recent advances in understanding electron flow in electron presheaths [1].
正偏压电极附近的鞘理论
只提供摘要形式。最近的工作[1]表明,电子鞘,如收集电子饱和电流的Langmuir探针周围的电子鞘,可以通过预鞘影响体等离子体。与典型的离子预鞘(离子通过电场直接加速)不同,电子预鞘通过压力梯度产生的力将电子加速到接近电子热速度。在典型的低温等离子体条件下,电子预鞘可以比相同等离子体条件下的离子预鞘长几倍。这项工作表明,当电极靠近介电表面时,电子预鞘层可以包含一个虚拟阴极,这是鞘层前面等离子体电位的局部最小值。鉴于最近在理解电子预鞘层中的电子流方面取得的进展,我们重新审视了与这一层相关的物理学,包括来自势阱的离子泵送[1]。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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