A High-Performance 3D Imaging Technique Using Simultaneous Azimuth and Elevation Compounding

Nicholas A. Campbell, Nicole MacMullin, Rachel. Kiefl, Eptehal Nashnoush, K. Latham, C. D. Emery, Jeremy A. Brown
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Abstract

A new technique for 3D imaging with a row-column array configuration has been developed. The technique requires an electrostrictive piezoelectric for the active substrate. While the top set of electrodes are connected to RF transmit and receive channels for conventional diverging wave imaging, the orthogonal bottom set of electrodes are connected to independently controlled variable DC bias channels. By implementing modulated bias patterns compounded across multiple pulses, fine delay control across the bottom elements can be achieved simultaneously to imaging with the top set of electrodes. This resulted in a high-quality 2-way focus in both azimuth and elevation. A 20 MHz electrostrictive composite substrate was fabricated and 64 top by 64 bottom electrodes were patterned and connected to custom beamforming and biasing electronics. The point spread functions were generated in all dimensions and the -6 dB resolution was measured to be 93 µm axially, 272 µm in the azimuth, and 328 µm in the elevation dimension. This was in good agreement with the simulated resolutions of 80 µm, 273 µm, and 280 µm respectively.
同时使用方位和仰角复合的高性能三维成像技术
提出了一种新的行-列阵列三维成像技术。该技术需要电致伸缩压电作为有源衬底。上面一组电极连接到常规发散波成像的射频发射和接收通道,而下面一组正交电极连接到独立控制的可变直流偏置通道。通过实现跨多个脉冲复合的调制偏置模式,可以同时实现跨底部元件的精细延迟控制,从而与顶部电极集进行成像。这导致了高质量的方位角和仰角双向聚焦。制作了20 MHz电致伸缩复合衬底,并对64个顶电极和64个底电极进行了图案化处理,并连接到定制的波束形成和偏置电子器件。在所有维度上生成点扩展函数,测得-6 dB分辨率为轴向93µm,方位角272µm,高程328µm。这与模拟分辨率分别为80µm、273µm和280µm的结果一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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