Low loss InP-based photonic crystal waveguides etched with Ar/Cl/sub 2/ chemically assisted ion beam etching

Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551) Pub Date : 2001-09-30 DOI:10.1109/ECOC.2001.989035

M. Mulot, S. Anand, M. Swillo, M. Qiu, B. Jaskorzyńska, A. Talneau

引用次数: 6

Abstract

We demonstrate a loss of 1 dB/100 /spl mu/m in photonic crystal (PC) waveguides realized in a InP-based heterostructure by Ar/Cl/sub 2/ chemical assisted ion beam etching. The quality of PC etched with two different process conditions is compared by using the shape and the position of the mode-gap as an assessment tool.

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Ar/Cl/sub - 2/化学辅助离子束蚀刻低损耗inp基光子晶体波导

我们证明了通过Ar/Cl/sub - 2/化学辅助离子束刻蚀在inp基异质结构中实现光子晶体波导的损耗为1 dB/100 /spl mu/m。以模隙的形状和位置为评价工具，比较了两种不同工艺条件下PC刻蚀的质量。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551)

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