Study on IoT and Big Data Analysis of 12” 7 nm Advanced Furnace Process Exhaust Gas Leakage

Abstract

Modern FAB uses a large number of high-energy processes, including plasma, CVD, and ion implantation. Furnaces are one of the important tools for semiconductor manufacturing. According to the requirements of conversion production management, FAB installed a set of IoT-based research based on 12″ 7 nm-level furnaces chip process. Two furnace processing tool measurement points were set up in a 12-inch 7 nm-level factory in Hsinchu Science Park, Taiwan, this is a 24-hour continuous monitoring system, the data obtained every second is sequentially send and stored in the cloud system. This study will be set in the cloud database for big data analysis and decision-making. The lower limit of TEOS, C2H4, CO is 0.4, 1.5, 1 ppm. Semiconductor process, so that IoT integration and big data operations can be performed in all processes, this is an important step to promote FAB intelligent production, and also an important contribution to this research.