[The effect of dispersed silicon dioxide--aerosil A-300--on the growth of Saccharomyces cerevisiae yeasts].

Abstract

High-dispersed silicon dioxide--aerosil A-300 has been studied for its effect on the growth of yeast Saccharomyces cerevisiae. It is shown that at heterophase cultivation of these microorganisms under periodical conditions introduction of aerosil A-300 induces a decrease of the lag phase duration and an increase of the maximum specific growth rate and economic coefficient of the carbon substrate utilization. This high-dispersed material has exerted the similar effect under the conditions of chemostatic cultivation. Optimal parameters of this process are determined.