X. C. Zhang, G. Zheng, Shaoling Guo, Y. Gui, J. Chu
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引用次数: 0
Abstract
A new passivation film: evaporated CdTe/ZnS combination film was grown on HgCdTe and the interface was characterized by capacitance-voltage (CV) characteristics of metal-insulator- semiconductor (MIS) test structures. Under proper processing conditions, the interface electrical parameters are: density of fixed charge approximately -4.0 X 1010 cm-2, density of slow state approximately 5.1 X 1010cm-2, density of fast interface state approximately 2.7 X 1011cm-2eV-1, and the time stability is good. These results show CdTe/ZnS double layer film is suitable for passivation of HgCdTe infrared detectors. We have also investigated single layer ZnS and anodic oxide/CdTe/ZnS triple layer film and found that the time stability of ZnS isn't good, and there exists too high density of fixed positive charge at the triple layer film//HgCdTe interface.
在HgCdTe上生长了一种新的钝化膜:蒸发CdTe/ZnS复合膜,并用金属-绝缘体-半导体(MIS)测试结构的电容-电压(CV)特性对其界面进行了表征。在适当的加工条件下,界面电参数为:固定电荷密度约为-4.0 X 1010cm-2,慢态密度约为5.1 X 1010cm-2,快态密度约为2.7 X 1011cm-2eV-1,时间稳定性较好。结果表明,CdTe/ZnS双层膜适合用于HgCdTe红外探测器的钝化。我们还研究了单层ZnS和阳极氧化物/CdTe/ZnS三层膜,发现ZnS的时间稳定性不佳,并且在三层膜//HgCdTe界面处存在过高的固定正电荷密度。