Hostaflon TFM "second generation" fluoropolymer for improved contamination control

Abstract

Polytetrafluoroethylene (PTFE) and per-fluorinated fluorothermoplastics such as PFA, a copolymer of tetrafluoroethylene with some 4 wt% perfluoroalkylvinylether, have become materials of choice in semiconductor manufacturing machinery for critical chemical and gas interface components. Hostaflon TFM, the 2nd generation PTFE, complements PFA in semiconductor applications in a way that cannot be achieved by non-modified PTFE. This paper identifies the benefits in contamination control and reliability of Hostaflon TFM components used in the semiconductor manufacturing industry.