New approach to the manufacturing of power microwave bipolar transistors at an irradiation of ohmic contacts: a computer simulation

Abstract

Method providing possibility of controllable creation of areas with demanded physical and chemical properties is a key condition for radical progress in modern technologies. It is especially actual for creation of areas with the nanometer sizes. Two-dimensional physical modeling of process of an irradiation by phosphorus ions of generated ohmic contacts Mo-Si to the emitter of the silicon bipolar powerful transistor which structure has been made on new and standard technologies for the first time is demonstrated. Possibilities of this method are investigated and confirmed experimentally. In particular, it is shown that there is a possibility of purposeful change of a chemical compound on border Mo-Si, electrophysical properties of contacts molybdenum-silicon, electrophysical characteristics of areas of transistor structure, frequency and power parameters of transistors. Modeling was spent using of a program complex of company SILVACO.