Thermal analysis of ultra-thin body device scaling [SOI and FinFet devices]

E. Pop, R. Dutton, K. Goodson
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引用次数: 83

Abstract

This paper explores the effect of confined dimensions and complicated geometries on the self-heating of ultra-thin body SOI and FinFET devices. A compact thermal model is introduced, incorporating the most advanced understanding of nanoscale heat conduction available. Novel device scaling is analyzed from a thermal point of view. We show device temperatures are very sensitive to the choice of drain and channel extension dimensions, and suggest a parameter design space which can help alleviate thermal problems. ITRS power guidelines below the 25 nm technology node should be revised if isothermal scaling of thin-body devices is desired.
超薄体器件缩放的热分析[SOI和FinFet器件]
本文探讨了有限的尺寸和复杂的几何形状对超薄体SOI和FinFET器件自热的影响。介绍了一个紧凑的热模型,结合了纳米级热传导的最先进的理解。从热的角度分析了新型器件的结垢问题。我们展示了器件温度对漏极和通道延伸尺寸的选择非常敏感,并提出了一个参数设计空间,可以帮助缓解热问题。如果需要薄体器件的等温缩放,则应修改25纳米技术节点以下的ITRS功率指南。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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