Impact of Process Variation Induced Transistor Mismatch on Sense Amplifier Performance

S. Rodrigues, M. S. Bhat
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引用次数: 9

Abstract

Sense amplifier is a very critical peripheral circuit in memories as its performance strongly affects both memory access time, and overall memory power dissipation. As the device dimensions scale below 100nm, the process variations are increasing and are impacting the circuit design significantly. The circuit yield loss caused by the process and device parameter variation has been more pronounced than before [1]. In this paper, effects of process variation induced transistor mismatch on sense amplifier performance are studied. A comparative study of the effect of mismatch on delay and yield for different sense amplifier configurations at 90 nm technology is presented.
工艺变化引起的晶体管失配对感测放大器性能的影响
感测放大器是存储器中非常关键的外围电路,它的性能对存储器的访问时间和存储器的整体功耗都有很大的影响。随着器件尺寸缩小到100nm以下,工艺变化越来越大,对电路设计产生了重大影响。工艺和器件参数变化引起的电路良率损失比以前更加明显[1]。本文研究了工艺变化引起的晶体管失配对感测放大器性能的影响。比较研究了在90nm技术下,不同的传感器放大器配置对延时和良率的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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