Energy-Efficient Adiabatic Circuits Using Transistor-Level Monolithic 3D Integration

Ivan Miketic, E. Salman
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Abstract

Charge-recycling adiabatic circuits are recently receiving increased attention due to both high energy-efficiency and higher resistance against side-channel attacks. These characteristics make adiabatic circuits a promising technique for Internet-of-things based applications. One of the important limitations of adiabatic logic is the higher intra-cell interconnect capacitance due to differential outputs and cross-coupled pMOS transistors. Since energy consumption has quadratic dependence on capacitance in adiabatic circuits (unlike conventional static CMOS where dependence is linear), higher interconnect capacitance significantly degrades the overall power savings that can be achieved by adiabatic logic, particularly in nanoscale technologies. In this paper, monolithic 3D integrated adiabatic circuits are introduced where transistor-level monolithic 3D technology is used to implement adiabatic gates. A 45 nm two-tier Mono3D PDK is used to demonstrate the proposed approach. Monolithic inter-tier vias are leveraged to significantly reduce parasitic interconnect capacitance, achieving up to 47% reduction in power-delay product as compared to 2D adiabatic circuits in a 45 nm technology node.
电荷回收绝热电路由于其高能效和抗侧通道攻击的能力而受到越来越多的关注。这些特性使绝热电路成为基于物联网应用的一种很有前途的技术。绝热逻辑的一个重要限制是由于差分输出和交叉耦合的pMOS晶体管导致较高的胞内互连电容。由于在绝热电路中,能量消耗与电容具有二次依赖关系(不像传统的静态CMOS,其依赖关系是线性的),较高的互连电容显著降低了绝热逻辑可以实现的整体功耗节约,特别是在纳米级技术中。本文介绍了单片三维集成绝热电路,其中采用晶体管级单片三维技术实现绝热栅极。采用45纳米双层Mono3D PDK来演示所提出的方法。单片层间通孔可显着降低寄生互连电容,与45纳米技术节点的2D绝热电路相比,可将功率延迟产品降低47%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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