Improvement Of Overlay Accuracy In SR Lithography For Gigabit-Scale Dram Fabrication

Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135) Pub Date : 1998-07-13 DOI:10.1109/IMNC.1998.730006

M. Suita, T. Hifumi, H. Sumitani, K. Itoga, H. Ootera, K. Marumoto, W. Wakamiya, T. Matsumoto, T. Yamamoto, R. Edo, S. Ohishi, K. Sentoku

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Abstract

Muneyoshi Suita, Takashi Hifumi, Hiroaki Sumitani, Kenji Itoga, Hiroki Ootera and Kenji Marumoto Advanced Technology R&D Center, Mitsubishi Electric Corp., 8-1 -1, Tsukaguchi-Honmachi, Amagasaki, Hyogo 661 -8661, Japan Wataru Wakamiya ULSl Laboratory, Mitsubishi Electric Corp., 4-1, Mizuhara, Itami, Hyogo 664, Japan Matsumoto, Takeshi Yamamoto, Ryo Edo, Satoru Ohishi and Koichi Sentoku Nanotechnology Research Center, Canon Inc., 20-2, Kiyohara Kogyo-Danchi, Utsunomiya, Tochigi, 321 -32, Japan

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千兆级Dram制造中SR光刻覆盖精度的提高

Muneyoshi Suita, Takashi Hifumi, Hiroaki Sumitani, Kenji Itoga, Hiroki Ootera and Kenji Marumoto Advanced Technology R&D Center, Mitsubishi Electric Corp., 8-1 -1, Tsukaguchi-Honmachi, Amagasaki, Hyogo 661 -8661, Japan Wataru Wakamiya ULSl Laboratory, Mitsubishi Electric Corp、4-1, Mizuhara, Itami, Hyogo 664, Japan Matsumoto, Takeshi Yamamoto, Ryo Edo, Satoru Ohishi and Koichi Sentoku Nanotechnology Research Center, Canon Inc.

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Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)

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