Deposition and X-ray photoelectron spectroscopy studies on sputtered cerium dioxide thin films

Abstract

Cerium dioxide is a rare earth oxide material which may be useful for various optical and electronic applications because of its high refractive index and dielectric constant. Cerium dioxide thin films were deposited on to glass substrates using r.f. magnetron sputtering. A cerium dioxide target was used for sputtering and films were deposited for various oxygen-argon gas flow ratios under different sputtering power levels. X-ray photoelectron spectroscopy analysis were performed on these films and the results are presented in terms of deposition conditions.