ZnO thin films for high frequency SAW devices

H. Ieki, M. Kadota
{"title":"ZnO thin films for high frequency SAW devices","authors":"H. Ieki, M. Kadota","doi":"10.1109/ULTSYM.1999.849403","DOIUrl":null,"url":null,"abstract":"Sezawa wave on a ZnO/sapphire substrate is applied to low insertion loss surface acoustic wave (SAW) filters in microwave band of 1.5 GHz to 2.5 GHz range. RF planar magnetron sputtering (RF-Mg) is used for the fabrication of epitaxial ZnO film. Sputtering conditions and the dopant are decided to realize a stable and reproducible process. Details of ZnO epitaxial growth and practical application results are reviewed. To improve the piezoelectric properties of ZnO film, electron cyclotron resonance (ECR) sputtering is investigated. The ZnO/quartz substrate has small temperature coefficient of frequency (TCF) and medium electromechanical coupling coefficient (ks) comparable to ST cut quartz and Li2B4O7 respectively. Theoretical and experimental results are also discussed.","PeriodicalId":339424,"journal":{"name":"1999 IEEE Ultrasonics Symposium. Proceedings. International Symposium (Cat. No.99CH37027)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-10-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"20","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 IEEE Ultrasonics Symposium. Proceedings. International Symposium (Cat. No.99CH37027)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ULTSYM.1999.849403","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 20

Abstract

Sezawa wave on a ZnO/sapphire substrate is applied to low insertion loss surface acoustic wave (SAW) filters in microwave band of 1.5 GHz to 2.5 GHz range. RF planar magnetron sputtering (RF-Mg) is used for the fabrication of epitaxial ZnO film. Sputtering conditions and the dopant are decided to realize a stable and reproducible process. Details of ZnO epitaxial growth and practical application results are reviewed. To improve the piezoelectric properties of ZnO film, electron cyclotron resonance (ECR) sputtering is investigated. The ZnO/quartz substrate has small temperature coefficient of frequency (TCF) and medium electromechanical coupling coefficient (ks) comparable to ST cut quartz and Li2B4O7 respectively. Theoretical and experimental results are also discussed.
用于高频SAW器件的ZnO薄膜
将ZnO/蓝宝石衬底上的Sezawa波应用于1.5 GHz ~ 2.5 GHz微波波段的低插入损耗表面声波(SAW)滤波器。采用射频平面磁控溅射(RF- mg)技术制备ZnO外延薄膜。决定了溅射条件和掺杂剂,以实现一个稳定和可重复的过程。综述了ZnO外延生长的详细情况和实际应用结果。为了提高ZnO薄膜的压电性能,研究了电子回旋共振(ECR)溅射技术。ZnO/石英衬底具有较小的频率温度系数(TCF)和中等的机电耦合系数(ks),分别与ST切割石英和Li2B4O7相当。并对理论和实验结果进行了讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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