SEE Responses of Mos-SIC, Mos-si and Sic Mosfet

F. Pintacuda, S. Massetti, A. Javanaien, M. Muschitiello, V. Cantarella
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Abstract

This paper report the SEE results measured on Mos-SiC, Mos-Si and SiC Mosfet. The goal of this study is to characterize SiC oxides gate as one of the key factors for rad-hard SiC MOSFET development.
Mos-SIC、Mos-si和Sic Mosfet的SEE响应
本文报道了在Mos-SiC、Mos-Si和SiC Mosfet上测量SEE的结果。本研究的目的是表征碳化硅氧化物栅极是发展耐辐射碳化硅MOSFET的关键因素之一。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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