Modeling and analysis of surface roughness in fused silica by CO2 laser smoothing

Xinyu Luo, Wei Yang, Yaguo Li
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Abstract

The research of CO2 laser smoothing fused silica to achieve smooth surface was investigated by simulations and experiments. Micro-flow smoothing of fused silica was numerically simulated. In the experiments, the influence of processing parameters, such as P (laser power), v (scanning velocity) and d (scanning path pitch) were taken into account on surface roughness (Ra) after laser irradiation. The results show that the roughness is rapidly reduced from 183.6nm to 14.27nm under P=35W, v=0.2mm/s, d=1.0mm, and thus the smooth surface is obtained. On the other hand, the raster structure will appear on the surface at inappropriate parameters (P=30W or v=0.5mm/s or d=2.0mm). The surface roughness highly influenced by raster structure ranges from ~40nm to ~140nm, 140.9nm for P=30W, 71.6nm for v=0.5mm/s, 41.3nm for d=2.0mm.
CO2激光光滑法对熔融石英表面粗糙度的建模与分析
通过仿真和实验研究了CO2激光光顺熔融二氧化硅以获得光滑表面的方法。对熔融石英的微流动平滑进行了数值模拟。实验中考虑了P(激光功率)、v(扫描速度)和d(扫描路径间距)等工艺参数对激光辐照后表面粗糙度Ra的影响。结果表明:当P=35W, v=0.2mm/s, d=1.0mm时,表面粗糙度从183.6nm迅速降低到14.27nm,获得了光滑的表面;另一方面,在不合适的参数(P=30W或v=0.5mm/s或d=2.0mm)下,表面会出现光栅结构。光栅结构对表面粗糙度的影响范围为~40nm ~ ~140nm, P=30W时为140.9nm, v=0.5mm/s时为71.6nm, d=2.0mm时为41.3nm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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