Analysis of impedance matching control

Abstract

This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 [Ω]. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 [Ω]. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.