Measurements Of Gas Temperature In Microwave Plasma At Atmospheric Pressure By Molecular Emission Spectrometry

Lei Deng, Guixin Zhang, Cheng Liu, Hong Xie
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Abstract

In this study, gas temperature measurements of argon, nitrogen, and air microwave plasma are achieved by the molecular emission spectrometry of the $A^{2} \sum ^{+} \rightarrow X^{2} \prod _{r}$ electronic system of OH radical[1, 2], and the gas temperatures at different microwave power and gas flow rate are explored, the axial temperature distributions of nitrogen and air microwave plasma plume are measured. The experimental results show that the microwave plasma core temperature is higher than 2000 K at different working conditions, even up to over 6000 K in air microwave plasma. At the same working condition, the three kind of microwave plasma gas temperature meet $T_{Ar}\, \lt T_{N2}\, \lt T_{Air}$. The gas temperature increases slightly with the increase of microwave power, decreases slightly with the decrease of gas flow overall. The gas temperature of nitrogen and air microwave plasma plume reduces quickly along the axial direction. In order to verify the accuracy of molecular emission spectrometry, the thermocouple is used as a comparison to measure the temperature of the DBD argon plasma. Experiments show that the temperature measurement results of molecular emission spectrometry and thermocouple are very consistent.
用分子发射光谱法测量常压微波等离子体中的气体温度
本研究通过OH自由基$A^{2} \sum ^{+} \rightarrow X^{2} \prod _{r}$电子系统的分子发射光谱法实现了氩气、氮气和空气微波等离子体的气体温度测量[1,2],探索了不同微波功率和气体流速下的气体温度,测量了氮气和空气微波等离子体羽流的轴向温度分布。实验结果表明,在不同的工作条件下,微波等离子体的核心温度均高于2000k,空气微波等离子体的核心温度最高可达6000 K以上。在相同的工作条件下,三种微波等离子体气体温度满足$T_{Ar}\, \lt T_{N2}\, \lt T_{Air}$。随着微波功率的增加,气体温度略有上升,随着气体总流量的减小,气体温度略有下降。氮气和空气微波等离子体羽流的气体温度沿轴向迅速降低。为了验证分子发射光谱法的准确性,采用热电偶作为对比,测量了DBD氩等离子体的温度。实验表明,分子发射光谱法测温结果与热电偶测温结果非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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