Photoluminescence of rapid-thermal annealed Mg-doped GaN films

L.S. Wang, W. Fong, C. Surya, K. Cheah, W. Zheng, Z. Wang
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引用次数: 16

Abstract

We report investigation of temperature and excitation power dependencies in photoluminescence spectroscopy measured from Mg-doped GaN epitaxial layers grown on sapphire by metalorganic chemical vapor deposition. The objective is to examine the effects of rapid-thermal annealing on Mg related emissions. It is observed that the peak position of the 2.7/spl sim/2.8 eV emission line is a function of the device temperature and detailed annealing procedure. The phenomenon is attributed to Coulomb-potential fluctuations in the conduction and valence bandedges and impurity levels due to the Mg-related complex dissociation. The blue shifts of the 2.7/spl sim/2.8 eV emission lines with increasing excitation power provides clear evidence that donor-acceptor recombination process underlies the observed emission spectrum.
快速热退火掺镁GaN薄膜的光致发光
我们报道了用金属有机化学气相沉积法在蓝宝石上生长的掺杂mg的GaN外延层的光致发光光谱测量中温度和激发功率的依赖关系。目的是研究快速退火对镁相关辐射的影响。观察到2.7/spl sim/2.8 eV发射线的峰值位置是器件温度和详细退火程序的函数。这一现象归因于导价能带和杂质能级的库仑电位波动。随着激发功率的增加,2.7/spl sim/2.8 eV发射谱线的蓝移清楚地证明了供体-受体复合过程是观测到的发射光谱的基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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