Shang-Chun Lu, Yuanchen Chu, Youngseok Kim, M. Mohamed, Gerhard Klimeck, T. Palacios, Umberto Ravaioli
{"title":"Design Guidelines and Limitations of Multilayer Two-dimensional Vertical Tunneling FETs for UltraLow Power Logic Applications","authors":"Shang-Chun Lu, Yuanchen Chu, Youngseok Kim, M. Mohamed, Gerhard Klimeck, T. Palacios, Umberto Ravaioli","doi":"10.1109/SISPAD.2018.8551731","DOIUrl":null,"url":null,"abstract":"New designs for vertical 2D-materials-based TFETs are proposed in this paper adopting asymmetric layer numbers for the top and bottom layer with undoped source/drain using Black Phosphorus as an example. The results show that abrupt turn-on and Ion/Ioff > 105 can be sustained when the channel length is down to sub-5 nm. The results are benchmarked against other TFETs based on promising 2D materials homo-/hetero-structures, meanwhile, the limitations, as well as guidelines, are presented.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2018.8551731","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
New designs for vertical 2D-materials-based TFETs are proposed in this paper adopting asymmetric layer numbers for the top and bottom layer with undoped source/drain using Black Phosphorus as an example. The results show that abrupt turn-on and Ion/Ioff > 105 can be sustained when the channel length is down to sub-5 nm. The results are benchmarked against other TFETs based on promising 2D materials homo-/hetero-structures, meanwhile, the limitations, as well as guidelines, are presented.