Highly textured ZnO thin films and SnO/sub 2//ZnO bilayer films prepared by the pyrosol process

Jinsoo Song, C. Lee, K. Lim, K. Yoon, K. Yu
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Abstract

Indium-doped ZnO(ZnO:In) films have been prepared on heated Corning 7059 glass by pyrosol spray method. Indium improves the conductivity as an n-type dopant and stimulates grain growth. For films grown at 400/spl deg/C, resistivity of ZnO films decreased from 1.3/spl times/10/sup -2/ /spl Omega/ cm to 3.5/spl times/10/sup -3/ /spl Omega/ cm by doping 1 wt% indium. Furthermore, ZnO:In films grown at higher temperture revealed larger grain sizes and a higher texturization compared to undoped films. A highly textured ZnO:In films with resistivity of 2.5/spl times/10/sup -3/ /spl Omega/ cm, total transmittance of 80% was made at the substrate temperature of 475/spl deg/C, and was milky looking. ZnO:In films did not degrade under hydrogen plasma, and was applied as a protection barrier against hydrogen plasma and the light scattering layer in the SnO/sub 2//ZnO bilayer films. Bilayer films have a resistivity of 8.8/spl times/10/sup -4/ /spl Omega/ cm and total transmittance of 84% at 550 nm, and was proved to have an excellent hydrogen plasma durability.
热溶胶法制备高织构ZnO薄膜和SnO/ sub2 //ZnO双层膜
采用热溶胶喷雾法在加热的康宁7059玻璃上制备了掺杂铟的ZnO(ZnO:In)薄膜。铟作为n型掺杂剂提高了电导率,促进了晶粒的生长。在400/spl℃下生长的ZnO薄膜,掺杂1 wt%的铟后,ZnO薄膜的电阻率从1.3/spl times/10/sup -2/ /spl Omega/ cm降至3.5/spl times/10/sup -3/ /spl Omega/ cm。此外,与未掺杂薄膜相比,在较高温度下生长的ZnO:In薄膜显示出更大的晶粒尺寸和更高的织构化。在电阻率为2.5/spl × /10/sup -3/ /spl ω / cm的薄膜中,衬底温度为475/spl℃时,薄膜的总透过率为80%,呈乳状。ZnO:In薄膜在氢等离子体作用下不降解,作为氢等离子体的保护屏障和SnO/sub 2/ ZnO双层膜的光散射层。双层膜的电阻率为8.8/spl × /10/sup -4/ /spl ω / cm,在550 nm处的总透过率为84%,具有优异的氢等离子体耐久性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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