Equal sidelobe patterns for microstrip patch antenna arrays

Vaibhav Monga, K. J. Vinoy
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引用次数: 2

Abstract

In this paper, we investigate the effect of microstrip patch element pattern on the linear array excitation required for equal sidelobes. Due to the pattern multiplication rule, the element pattern weights the array factor differently at different angles, therefore, excitation required for equal sidelobes will be different from the isotropic chebyshev case. Both broadside and scanning cases have been discussed and a method to obtain equal sidelobes for both cases has been given. Since, the microstrip patch element pattern, either in E-plane or H-plane, is dependent on its dimensions, the effect of changing the dimensions has also been discussed. It is shown that the broadside beamwidth(FNBW) of the new excitation is better than the Isotropic Dolph excitation.
微带贴片天线阵列的等旁瓣图
在本文中,我们研究了微带贴片元件模式对等旁瓣所需的线阵激励的影响。由于模式倍增规则,单元模式在不同角度对阵列因子的权重不同,因此,等旁瓣所需的激励将不同于各向同性切比雪夫情况。讨论了宽边和扫描两种情况,并给出了两种情况下获得等边瓣的方法。由于e面或h面微带贴片元件的图案依赖于其尺寸,因此也讨论了改变尺寸的影响。结果表明,新激励的宽波束宽度(FNBW)优于各向同性的Dolph激励。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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