Design Optimization of High Voltage NPN ESD Protection Device in 130nm Power SOI Technology

Raunak Kumar, J. Zeng, K. Hwang, R. Gauthier
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Abstract

A HV NPN ESD devices is evaluated in a 130nm Power SOI technology. Current flow and temperature distribution under ESD stress is investigated by TCAD and a new device architecture without STI is proposed. Non-uniform triggering issue is also investigated. Segment type layout design shows uniform triggering of multi-finger devices.
130nm功率SOI工艺中高压NPN ESD保护器件的设计优化
采用130nm Power SOI技术对HV NPN ESD器件进行了评估。利用TCAD研究了静电放电应力下的电流和温度分布,并提出了一种新的器件结构。研究了非均匀触发问题。分段式布局设计,多指设备触发均匀。
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