Improvements in room temperature lifetime of pixelated TlBr detectors from surface etching

S. O’Neal, W. Koehler, Zhong He, Hadong Kim, L. Cirignano, K. Shah, A. Conway, E. Swanberg, L. Voss, R. Graff, A. Nelson, S. Payne
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引用次数: 2

Abstract

Due to its wide band gap (2.68 eV) and high stopping power, thallium bromide (TlBr) is being investigated as a room-temperature semiconductor gamma-ray spectrometer. When cooled to -20°C, performance of better than 1% FWHM at 662 keV has been observed on 5×5×5 mm3 pixelated TlBr detectors. The room-temperature lifetime (under continuous bias) of thick TlBr detectors operated at high fields (~2000 V/cm) has been limited to weeks or months due to polarization caused by ionic conduction. Previous work has shown that the degradation process is limited to the surface and that surface preparation techniques can extend the lifetime of thin planar TlBr devices at room temperature. In this work, the lifetime and stability of two large 5×5×5 mm3 pixelated TlBr arrays are presented. Detector performance is compared for different surface preparation techniques and improved stability is observed. Additionally, we use depth-sensing techniques to track the depth-dependent photopeak centroids over time and conclude that once surface degradation effects are mitigated, TlBr performance can improve over time at room temperature. The improvement is likely similar to conditioning at -20°C in which the electric field stabilizes and becomes more uniform.
表面蚀刻对像素化TlBr探测器室温寿命的改善
溴化铊(TlBr)具有宽禁带(2.68 eV)和高阻挡功率的优点,被研究用于室温半导体伽马射线能谱仪。当冷却至-20°C时,在5×5×5 mm3像素化TlBr探测器上观察到662 keV下优于1% FWHM的性能。由于离子传导引起的极化,在高场(~2000 V/cm)下工作的厚TlBr探测器的室温寿命(在连续偏置下)被限制在几周或几个月。先前的研究表明,降解过程仅限于表面,表面制备技术可以延长薄平面TlBr器件在室温下的寿命。在这项工作中,介绍了两个大型5×5×5 mm3像素化TlBr阵列的寿命和稳定性。比较了不同表面制备技术的探测器性能,并观察到稳定性的提高。此外,我们使用深度传感技术跟踪随时间变化的与深度相关的光峰质心,并得出结论,一旦表面降解效应得到缓解,TlBr的性能可以在室温下随着时间的推移而改善。这种改进可能类似于在-20°C条件下,电场稳定并变得更加均匀。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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